- Thin film preparation
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Horizontal CVD Thin Film Prepa
- Stripping Equipment
- Automated equipment
- Cleaning equipment
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Fully automatic edge cleaning machine
- Special gas equipment
- Material accessories
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A fully automatic single-wafer cleaning system is a high-precision automated cleaning device specifically designed for individual wafers or substrates.
An automated equipment that achieves uniform photoresist coating through high-speed rotation.
An automated equipment used in semiconductor or PCB manufacturing processes to automatically complete photoresist developing and fixing processes.
Photoresist Stripping Equipment – Removes photoresist via chemical solvent or plasma methods.
